2025년 12월 1일
GA-Optimized Overlay Sampling
10-2025-0187557 · KP25137
발명자
Taekwon Jee, Jihoon Jung, Jeng-Hun Suh
출원인
SemiAI, Co.,Ltd.
정식 명칭
METHOD FOR OPTIMIZING SEMICONDUCTOR OVERLAY SAMPLING BASED ON A GENETIC ALGORITHM USING RULE-BASED SEEDING AND OVERLAY SAMPLING DEVICE USING THE SAME
요약
This invention relates to a genetic algorithm-based method and apparatus for optimizing semiconductor overlay sampling using rule-based seeding to improve both efficiency and accuracy in photolithography processes, addressing limitations of conventional rule-based and heuristic sampling methods that fail to capture nonlinear distortions and process variations. An initial population is generated by combining rule-based sampling results with random sampling, and optimal sampling positions are iteratively derived through genetic algorithm operations including fitness evaluation, selection, crossover, and mutation, where performance is assessed based on spatial uniformity, prediction error, and uncertainty. This approach enables high measurement accuracy with fewer sampling points, improves convergence speed, mitigates local optima issues, and provides a scalable and adaptive solution for dynamic semiconductor manufacturing environments.