Defect Model Simulator
Train, manage and simulate overlay correction recipes in one workspace Trains overlay models stage-by-stage on the selected wafer data, then applies recipes from a shared library to real measurements — previewing next-lot corrections before they reach production.
What it does
- 01
Physically meaningful multi-stage model training
Trains a registered model on the selected wafer measurements to isolate systematic components across three physical stages — Inter-field (global), Intra-field (in-shot) and CPE (per-exposure residual).
- 02
Recipe-driven correction simulation
Applies a recipe from the library — or a freshly trained model recipe — to real measurements, previewing the correction result before it reaches the next lot.
- 03
Recipe library management
Registers, edits and removes recipes — model structure with stage and coefficient combinations — in a shared library, then reuses the same recipes across training and simulation runs.
Available in
SMILE Lite
Acts as the core engine that decomposes measurements into inter-field, intra-field and CPE models and extracts corrections for the next lot.
SMILE Pro
Adds multimodal interpretation on top of Lite's multi-stage modeling, surfacing cause candidates for residual patterns in natural language.
SMILE Pro+
Inside Pro+, Virtual APC simulation joins PRISM forecasts and INFER diagnostics on top of the multi-stage model — validating next-lot corrections before they reach production.
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