Researching the hardest problems in semiconductor manufacturing.
Questions that start on the fab floor become research, and the results return to our products and the field.
Publications
Papers presented at SPIE Advanced Lithography.
- Virtual metrology for improving overlay control capability in high-NA half-field exposureOct 23, 2026
- Proactive yield maximization in photolithography via human-in-the-loop AI on an on-premise big data platformApr 10, 2026
- Hybrid machine learning framework for systematic optimization of overlay key positionsApr 10, 2026
- Domain knowledge-driven fusion machine learning for overlay prediction enhancementApr 08, 2026
- LLM-based overlay issue classification and solution optimization in semiconductor manufacturingApr 22, 2025
Patents
Patent portfolio in semiconductor processing, metrology, and RCA domains.
- United States
- 3
- Korea
- 7
As of October 28, 2026
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