SMILE

A modular AI platform spanning analysis, prediction and real-time control — adopted at the maturity your process is ready for.

An endless loop of cause-tracing.

Pinpointing a single root cause takes days — wafers keep moving, and dozens of engineer-hours drain away.

01

The limit of reactive APC

Human loop: data → view → analyze → act
Variance flagged after it hits the wafer
Yield loss already in the product

02

Combinatorial explosion in root cause

5 categories × ~10 sub-factors each
Experience covers only a subset
AI searches the full space in seconds

03

Generic AI doesn't fit the fab

Real fab data is restricted and scarce
No coverage of edge cases
Misses process–equipment–defect relations

SMILE — eight solutions, one product.

AI recommends.Engineers decide.Built on a human-in-the-loop protocol.

Before

Gut-feel chart exploration

Engineers read dozens of charts by eye
Trial-and-error cause hunting
Learning cycles: days to weeks
APC corrects after drift is detected

With SMILE

AI-guided, predictive analysis

AI highlights correlated signals instantly
Evidence-based root cause inference
Learning cycles: minutes to hours
PRISM predicts hotspots ahead of time

Eight solutions

PRISM

A real-time prediction engine for process drift

INFER

A causal reasoning engine for root cause analysis

Virtual Fab

A synthetic data infrastructure for AI training

Semi-Brain

A multimodal inference engine reasoning over charts, process context and a domain knowledge base

Business Intelligence Suite

A BI suite built on semiconductor-native visualizations and chained drill-downs

Sampling Optimizer

Automating the trade-off between metrology throughput and model fidelity

Defect Model Simulator

Train, manage and simulate overlay correction recipes in one workspace

Semi-Vision

An SEM measurement alignment engine

How SMILE fits each process.

Photolithography

Proactive wafer-level control of overlay hotspots

Predict issue wafers via Virtual Metrology
Feed-forward Lot N → N+1 control
Wafer-level control without rework

AppliedSMILE Pro+PRISM

In FEOL lithography, predict overlay errors in real time and push corrections forward — without rework.

Compare all products →

Where SMILE stands apart.

Beyond data processing and visualization, SMILE covers whole-wafer defect prediction and automated issue resolution in one platform.

11 domain charts

Wafer/Vector maps and other domain charts missing in general BI tools, plus 14 process-parameter filters out of the box.

AI collaboration

LLM directly interprets engineer-built charts. The intent-aware SemiAI Assistant supports analysis through conversation at any step.

End-to-end workflow

Filter → chart → AI interpretation → recommended analysis → Word report — connected without switching tools.

Capability	SMILE	General BI tools	Statistical tools	Semiconductor analytics
Semiconductor domain charts (Wafer / Vector map)
Multi-parameter process filters		Custom	Partial
ML-based modeling
Chart auto-interpretation (LLM)
Analysis flow visualization
Auto report generation		Plugin
Conversational AI assistant

A modular lineup, take what you need.

Each module can run standalone or together.

SMILE Lite

Unify analysis, sampling, and modeling into one workbench to accelerate HVM decisions.

SMILE Pro

Compress analysis time with real-time detection and multimodal reasoning.

SMILE Pro+

Two autonomous modes accelerate the engineer's analysis workflow end-to-end.

Custom configuration

Compose and tune solutions to match your specific process

Tell us the challenge — we'll scope it with you.

You don't need detailed data ready. We reply within two business days with a tailored deployment scenario.

Request a consultation